OPTIMIZATION OF TITANIUM NITRIDE FILM SYNTHESIS: CORRELATIONS BETWEEN THE STRUCTURE / MICRO-HARDNESS AND DEPOSITION CONDITIONS

Authors

  • Mariana POP Technical University, Faculty of Materials and Environmental Engineering, Bvd.Muncii 103-105, Cluj-Napoca. mariana.pop@ipm.utcluj.ro
  • G. NEGREA Technical University, Faculty of Materials and Environmental Engineering, Bvd.Muncii 103-105, Cluj-Napoca
  • A. POP Babeş-Bolyai University, Faculty of Physics, 1 Kogălniceanu str., 400084 Cluj-Napoca, Romania

DOI:

https://doi.org/10.24193/subbphys.2018.07

Keywords:

TiN films, DC sputtering, XRD,hardness.

Abstract

The DC sputtering method based on the variation of the potential of target function of nitrogen flow rate, for the deposition of titanium nitride (TiN) films, with the elementary chemical composition close to the stoichiometric one is presented. The process control method used in these experiments is the identification of the nitrogen flow required for the deposition of stoichiometric TiN layers by using the target potential as the reference parameter. The effects of the nitrogen flow, polarization voltage and discharge current on the structure, microstructure and micro-hardness of TiN films was studied.

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STUDIA UBB PHYSICA, Volume 63 (LXIII), No. 1-2, December 2018

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Published

2018-12-30

How to Cite

POP, M., NEGREA, G., & POP, A. (2018). OPTIMIZATION OF TITANIUM NITRIDE FILM SYNTHESIS: CORRELATIONS BETWEEN THE STRUCTURE / MICRO-HARDNESS AND DEPOSITION CONDITIONS. Studia Universitatis Babeș-Bolyai Physica, 63(1-2), 75–88. https://doi.org/10.24193/subbphys.2018.07

Issue

Volume 63, No. 1-2, 2018

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Articles

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